A complex of devices for the preparation of microstructures in the research and development of microelectronic circuits, sensors and microsystems. The research and development infrastructure of the Electron Lithography Department of the IISAS is divided into the following laboratories:
- Laboratory of electron lithography
- Laboratory of photolithography
- Laboratory of preparation of thin layers
- Laboratory of plasma etching
- Laboratory of optical microscopy
- Laboratory of evaluation, measurement and analysis of structures
- Chemical laboratory for working with acids, hydroxides, polymers, polyimides and chemical solutions
- Laboratory for the finalization of chips The basis of this research and development infrastructure are air-conditioned clean rooms in the building of IISAS.
