– The important infrastructure of the Department of Electron Lithography are other unique devices according to the following list, which are necessary for the evaluation and analysis of lithographic structures, the preparation of thin layers, photolithography, the measurement of the thickness of thin layers, processes with polymers, polyimides, chemicals and solutions, and the preparation of circuits for measurement:
Microscopic methods: scanning electron microscope with auto-emission cathode S-800 (Hitachi), resolution 2 nm. Optical microscopes.
Photolithographic equipment: MJB3 (Karl Suss), resolution 2 micrometers.
Deposition of thin films: device for magnetron sputtering SCM 600 (Alcatel) and device for electron gun evaporation (planetary system) (VEB HochvakuumDresden).
Repair of defects in thin chrome layers on photomasks: device with pulsed powerful laser beam NEC YL451 (NEC).
Measurement of the thickness of thin layers: Alphastep profilometer (Tencor Instruments), resolution of a few nanometers.
Processes with resists and polyimides: cleaning (Ultratech), spin coating in equipment (Convac 1001G, Convac 1001 GS ver. 8531), etching in acids, hydroxides and solutions, production of deionized water (W.Werner).
