They are divided into 3 categories:
- Conventional laboratory premises with air conditioning with an area of 90 m2.
- Clean rooms with powerful air conditioning with a minimum cleanliness class of 1000 and temperature stabilization of ±3°C with an area of 65 m2 (total area of this part 112 m2).
- Clean spaces with powerful air conditioning with a minimum cleanliness class of 1000 and a temperature stabilization of ±0.5°C with an area of 65 m2. List of devices:
– Among the unique and key facilities of the research and development infrastructure of the ÚI SAS are 2 electron lithographs with a variable cross-section of the electron beam:
electron lithographer ZBA 21S with an electron energy of 20 keV (Vistec-Leica Microsystems Lithography), which enables the preparation of structures in the submicrometer area of dimensions (minimum reproducible dimension 400 nm) on substrates with a diameter of up to 15 cm; electron lithographer ZBA 23 with an electron energy of 40 keV (Vistec-Leica Microsystems Lithography), which enables the preparation of structures in the submicrometer area of dimensions (minimum reproducible dimension 200 nm) on substrates with a diameter of up to 18 cm.