Devices for chip finalization: diamond saw, contactor (VEB Elektromat).
– Other equipment needed for the research specialization of the Department of Electron Lithography is provided in the framework of cooperation with other research workplaces. Plasma etching of structures by the method of reactive ion etching with an ECR source (ECR RIE) is ensured by cooperation with ElÚ SAV, and plasma etching of structures by the method of reactive ion etching with an ICP source (ICP RIE) is ensured by cooperation with FEI STU. Additional scanning electron microscopy is provided in cooperation with the National Institute of Social Sciences on the Quanta FEG250 (FEI) device.
