Projects

researcher
Ing. Adrian Ritomský

International

Finished
  • Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthesis
    Program: FP6
    Duration: 1. 4. 2005 – 30. 9. 2010
  • Innovation of sub-micrometer electron beam lithography
    Program: Bilateral - other
    Duration: 1. 1. 2007 – 31. 12. 2009
  • Radical Innovation Maskless Nanolithography
    Program: FP6
    Duration: 1. 10. 2005 – 30. 9. 2008

National

Current
  • Progressive methods of the transfer of nanostructured semiconductive 2D materials based on transition metal dichalcogenides onto microelectronic elements
    Program: VEGA
    Duration: 1. 1. 2022 – 31. 12. 2025
Finished
  • Electron beam lithography of nanometer structures for 2D materials on the base of metal sulfides
    Program: VEGA
    Duration: 1. 1. 2018 – 31. 12. 2021
  • Automatic assessment of acute stress from speech.
    Program: VEGA
    Duration: 1. 1. 2018 – 31. 12. 2020
  • Investigation of processes for the preparation of structures for nanometer scale devices
    Program: VEGA
    Duration: 1. 1. 2015 – 31. 12. 2017
  • Advanced micro- and nano-technological processes using electron-beam lithography
    Program: VEGA
    Duration: 1. 1. 2012 – 31. 12. 2014
  • Advanced piezoelectric MEMS pressure sensors
    Program: SRDA
    Duration: 1. 5. 2011 – 31. 10. 2014
  • (EkoWatt)
    Program: EU Structural Funds Research & Development
    Duration: 1. 1. 2011 – 31. 10. 2013
  • Investigation of novel nanolithographic technologies
    Program: VEGA
    Duration: 1. 1. 2009 – 31. 12. 2011
  • Center of Excellence for New Technologies in Electrical Engineering
    Program: EU Structural Funds Research & Development
    Duration: 15. 5. 2009 – 14. 5. 2011
  • Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthes
    Program:
    Duration: 1. 1. 2009 – 31. 12. 2009
  • Physics of Information
    Program:
    Duration: 1. 1. 2005 – 31. 12. 2008
  • Investigation of Novel Resist Materials for Next Generation Lithography
    Program: VEGA
    Duration: 1. 1. 2006 – 1. 12. 2008
Employees