Projects

researcher
Ing. Anna Konečníková

International

Finished
  • Semiconducting Metal Oxide - New Materials For Environmental Sensors
    Program: Mobility
    Duration: 1. 1. 2021 – 31. 12. 2022
  • Nano-structuring by Electron Beam Lithography for Sensor Application
    Program: Bilateral - other
    Duration: 9. 5. 2016 – 31. 12. 2017
  • Micro-, nano-technological processes for micro-, opto- and bio-electronic devices with utilization of UV-, DUV- and EB-lithography.
    Program: Bilateral - other
    Duration: 1. 1. 2009 – 31. 12. 2010
  • Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthesis
    Program: FP6
    Duration: 1. 4. 2005 – 30. 9. 2010
  • Innovation of sub-micrometer electron beam lithography
    Program: Bilateral - other
    Duration: 1. 1. 2007 – 31. 12. 2009
  • Microprocesses for large structured arrays with high pattern density suitable for realization of optoelectronic devices and holograms.
    Program: Bilateral - other
    Duration: 1. 1. 2007 – 31. 12. 2008
  • Radical Innovation Maskless Nanolithography
    Program: FP6
    Duration: 1. 10. 2005 – 30. 9. 2008

National

Current
  • Experimental System for Wireless Stimulation and Monitoring of Selected Biological Properties and Cognitive Abilities of Drosophila melanogaster.
    Program: SRDA
    Duration: 1. 9. 2024 – 30. 6. 2027
  • Environmental sensors based on 2D nanomaterials
    Program: SRDA
    Duration: 1. 8. 2024 – 31. 7. 2026
  • Progressive methods of the transfer of nanostructured semiconductive 2D materials based on transition metal dichalcogenides onto microelectronic elements
    Program: VEGA
    Duration: 1. 1. 2022 – 31. 12. 2025
Finished
  • Electron beam lithography of nanometer structures for 2D materials on the base of metal sulfides
    Program: VEGA
    Duration: 1. 1. 2018 – 31. 12. 2021
  • Investigation of processes for the preparation of structures for nanometer scale devices
    Program: VEGA
    Duration: 1. 1. 2015 – 31. 12. 2017
  • Advanced micro- and nano-technological processes using electron-beam lithography
    Program: VEGA
    Duration: 1. 1. 2012 – 31. 12. 2014
  • (CRISIS)
    Program: EU Structural Funds Research & Development
    Duration: 3. 1. 2011 – 31. 12. 2013
  • Investigation of novel nanolithographic technologies
    Program: VEGA
    Duration: 1. 1. 2009 – 31. 12. 2011
  • Center of Excellence for New Technologies in Electrical Engineering
    Program: EU Structural Funds Research & Development
    Duration: 15. 5. 2009 – 14. 5. 2011
  • Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthes
    Program:
    Duration: 1. 1. 2009 – 31. 12. 2009
  • Physics of Information
    Program:
    Duration: 1. 1. 2005 – 31. 12. 2008
  • Investigation of Novel Resist Materials for Next Generation Lithography
    Program: VEGA
    Duration: 1. 1. 2006 – 1. 12. 2008
Employees