Projects

RNDr. Viera Jablonská

International

Finished
  • Microprocesses for large structured arrays with high pattern density suitable for realization of optoelectronic devices and holograms.
    Program: Bilateral - other
    Duration: 1. 1. 2007 – 31. 12. 2008

National

Finished
  • Advanced micro- and nano-technological processes using electron-beam lithography
    Program: VEGA
    Duration: 1. 1. 2012 – 31. 12. 2014
  • (CRISIS)
    Program: EU Structural Funds Research & Development
    Duration: 3. 1. 2011 – 31. 12. 2013
  • Investigation of novel nanolithographic technologies
    Program: VEGA
    Duration: 1. 1. 2009 – 31. 12. 2011
  • Center of Excellence for New Technologies in Electrical Engineering
    Program: EU Structural Funds Research & Development
    Duration: 15. 5. 2009 – 14. 5. 2011
  • Technology for the Production of Massively Parallel Intelligent Cantilever – Probe Platform for Nanoscale Analysis and Synthes
    Program:
    Duration: 1. 1. 2009 – 31. 12. 2009
  • Investigation of Novel Resist Materials for Next Generation Lithography
    Program: VEGA
    Duration: 1. 1. 2006 – 1. 12. 2008
Employees