odborný pracovník
Ing. Anna Benčurová
Publikácie za rok 2026
Publikačná činnosť obsahuje údaje z on-line databázy Ústrednej Knižnice SAV.
Publikácie
- BENČUROVÁ, Anna - VUTOVA, Katia** - GOCHEVA-ILIEVA, Snezhana - ŠKRINIAROVÁ, Jaroslava - KONEČNÍKOVÁ, Anna - MANOILOV, Evgeniy - PREDANOCY, Martin - KOSTIČ, Ivan**. Study of the sidewall shape and proximity effect in PMMA bilayer on WS2 thin film. In Journal of Physics: Conference Series, 2026, vol. 3194, art. no. 012010. (2025: 0.18 - SJR). ISSN 1742-6588. Dostupné na: https://doi.org/10.1088/1742-6596/3194/1/012010 (VEIT 2025 : 24th International Summer School on Vacuum, Electron and Ion Technologies 2025.) Typ: ADMB
- KOSTIČ, Ivan** - MANOILOV, Evgeniy - BENČUROVÁ, Anna - KOLEVA, Elena - ANDOK, Robert - VUTOVA, Katia**. Profile study on different patterns in PMMA bilayer resist configurations under 20 keV electron beam exposure. In Nanomaterials-Basel, 2026, vol. 16, no. 20, art. no. 1311. (2025: 4.8 - IF, Q2 - JCR, 0.805 - SJR, Q1 - SJR). ISSN 2079-4991. Dostupné na: https://doi.org/10.3390/nano16201311 Typ: ADCA
- PREDANOCY, Martin - VUTOVA, Katia - BENČUROVÁ, Anna - KOLEVA, Elena - MANOILOV, Evgeniy - KOSTIČ, Ivan**. Study on patterns in electron beam lithography for sub-micrometer line gratings. In Industry 4.0, 2026, vol. 11, no. 4, p. 175-178. ISSN 2534-997X. Dostupné na internete: https://stumejournals.com/journals/i4/2026/4/175.full.pdf Typ: ADEB
- PREDANOCY, Martin - VUTOVA, Katia - BENČUROVÁ, Anna - RITOMSKÝ, Mário - MANOILOV, Evgeniy - KOSTIČ, Ivan**. Comparative study of the negative resists AR-N 7520 and ma-N 2410 in electron beam lithography. In AIP Conference Proceedings, 2026, vol. 3455, art. no. 020005. (2025: 0.146 - SJR). ISSN 0094-243X. Dostupné na: https://doi.org/10.1063/5.0327396 (APCOM 2025 : International Conference on Applied Physics of Condensed Matter.) Typ: ADMB