Publikácie

Publikácie za rok 2026

Publikácie

• BENČUROVÁ, Anna - VUTOVA, Katia** - GOCHEVA-ILIEVA, Snezhana - ŠKRINIAROVÁ, Jaroslava - KONEČNÍKOVÁ, Anna - MANOILOV, Evgeniy - PREDANOCY, Martin - KOSTIČ, Ivan**. Study of the sidewall shape and proximity effect in PMMA bilayer on WS2 thin film. In Journal of Physics: Conference Series, 2026, vol. 3194, art. no. 012010. (2025: 0.18 - SJR). ISSN 1742-6588. Dostupné na: https://doi.org/10.1088/1742-6596/3194/1/012010 (VEIT 2025 : 24th International Summer School on Vacuum, Electron and Ion Technologies 2025.) Typ: ADMB
• KADLEČÍKOVÁ, M.** - HOTOVÝ, I. - KUMAR, N. - KOSTIČ, Ivan - SOJKOVÁ, Michaela. E12g band of Raman spectral characteristics of nanostructured WS2 films sputtered on sapphire. In AIP Conference Proceedings : APCOM 2025, 2026, vol. 3455, art. no. 020001. (2025: 0.146 - SJR). ISSN 0094-243X. Dostupné na: https://doi.org/10.1063/5.0328520 Typ: ADMB
• KOSTIČ, Ivan** - MANOILOV, Evgeniy - BENČUROVÁ, Anna - KOLEVA, Elena - ANDOK, Robert - VUTOVA, Katia**. Profile study on different patterns in PMMA bilayer resist configurations under 20 keV electron beam exposure. In Nanomaterials-Basel, 2026, vol. 16, no. 20, art. no. 1311. (2025: 4.8 - IF, Q2 - JCR, 0.805 - SJR, Q1 - SJR). ISSN 2079-4991. Dostupné na: https://doi.org/10.3390/nano16201311 Typ: ADCA
• KOSTIČ, Ivan - VUTOVA, Katia - LUBY, Štefan**. Current state of nanopatterning in semiconductor integrated circuits. In Proceedings of ADEPT : 14th International Conference on Advances in Electronic and Photonic Technologies. Nový Smokovec, High Tatras, Slovakia June 5-18, 2026. Eds. S. Kováčová, J. Kováč, jr., I. Lettrichová. - Zilina : Univ. Zilina in EDIS, 2026, p. 41-46. (14th International Conference on Advances in Electronic and Photonic Technologies : ADEPT 2026.) Typ: AFD
• KUMAR, N. - HOTOVÝ, I.** - KADLEČÍKOVÁ, M. - SOJKOVÁ, Michaela - KOSTIČ, Ivan - GREGUŠOVÁ, Dagmar - POHORELEC, Ondrej - STOPJAKOVÁ, V. - DOBROČKA, Edmund. Low-temperature ammonia sensing using sulfurized WS2 thin films. In Sensors, 2026, vol. 26, art. no. 4429. (2025: 4 - IF, Q2 - JCR, 0.802 - SJR, Q1 - SJR). ISSN 1424-8220. Dostupné na: https://doi.org/10.3390/s26144429 . VEGA 2/0075/25 : Heteroštruktúry na báze 2D dichalkogenidov prechodných kovov pre elektronické. APVV-21-0278 : Nanoštrukturované tenkovrstvové materiály vyznačujúce sa slabými väzbovými interakciami pre elektronické a senzorické aplikácie. Typ: ADCA
• KUMAR, N. - HOTOVÝ, I. - SOJKOVÁ, Michaela - KADLEČÍKOVÁ, M. - ARBET, D. - KOSTIČ, Ivan. P-to-N conductance transition in WS₂ Thin Films as a gas signature for NH₃ sensing. In ASDAM 2026 : Conference Proceedings. The Sixteenth International Conference on Advanced Semiconductor Devices and Microsystems. Eds. E. Vavrinsky, J. Marek. - IEEE, 2026, p. 284-290. ISBN 979-8-3195-0043-4. Typ: AFC
• NEMEC, Pavol - VUTOVA, Katia - KONEČNÍKOVÁ, Anna - KOSTIČ, Ivan - MANOILOV, Evgeniy - ŠKRINIAROVÁ, Jaroslava. Surface characterization of 2D layers for sensor applications using SEM and 3D laser microscopy. In Industry 4.0, 2025, vol. 10, no. 5, p. 174-177. ISSN 2534-997X. Dostupné na internete: https://stumejournals.com/journals/i4/2025/5/174.full.pdf Typ: ADEB
• PREDANOCY, Martin - VUTOVA, Katia - BENČUROVÁ, Anna - KOLEVA, Elena - MANOILOV, Evgeniy - KOSTIČ, Ivan**. Study on patterns in electron beam lithography for sub-micrometer line gratings. In Industry 4.0, 2026, vol. 11, no. 4, p. 175-178. ISSN 2534-997X. Dostupné na internete: https://stumejournals.com/journals/i4/2026/4/175.full.pdf Typ: ADEB
• PREDANOCY, Martin - VUTOVA, Katia - BENČUROVÁ, Anna - RITOMSKÝ, Mário - MANOILOV, Evgeniy - KOSTIČ, Ivan**. Comparative study of the negative resists AR-N 7520 and ma-N 2410 in electron beam lithography. In AIP Conference Proceedings, 2026, vol. 3455, art. no. 020005. (2025: 0.146 - SJR). ISSN 0094-243X. Dostupné na: https://doi.org/10.1063/5.0327396 (APCOM 2025 : International Conference on Applied Physics of Condensed Matter.) Typ: ADMB