• Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia, www.elu.sav.sk.
Collaboration in SEM, Deep-UV lithography, E-Beam Lithography, Thin film preparation, Dry Etching (RIE) and Sensors development.

• Institute of Electronics and Photonics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology in Bratislava, Slovakia, www.fei.stuba.sk.
Collaboration in Dry Etching (ICP RIE), Photonic devices development and Sensors development.

• Department of Experimental Physics, Fakulty of mathematics, physics and informatics, Comenius University in Bratislava, www.dep.fmph.uniba.sk
Collaboration in E-Beam Lithography.

• Institute of Electronics, Bulgarian Academy of Sciences, Sofia, Bulgaria, http://www.ie-bas.dir.bg/
Collaboration in E-Beam Lithography and simulations.

• Institute of Microelectronics, NCSR Demokritos, Athens, Greece, www.imel.demokritos.gr
Collaboration in E-Beam Lithography.

• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Poland. www.wemif.pwr.wroc.pl
Collaboration in E-Beam Lithography application.

• Laboratoire de Physique des Matériaux et des Surfaces, Université de Cergy-Pontoise. Rue d’Eragny, Neuville sur Oise, 95 031 Cergy-Pontoise, http://lpms-cea.u-cergy.fr
Collaboration in the development of a new type of electron spin polarimeter based on spin-filtering effects in ferromagnetic thin films.