Laboratory for EBL and micro-technology Leader: Ing. Mgr. R. Andok, PhD. |
The R&D infrastructure of Electron beam lithography Department is divided into the following laboratories:
1. Laboratory of electron-beam lithography The base of this R&D infrastructure are air-conditioned cleanrooms in the building of our Institute. They can be divided into three categories: Equipment in Laboratories is listed: • Among the unique and key equipment of the R&D infrastructure of the applicant belong 2 electron-beam pattern generators (lithographs) with variable beam cross-section of the electron beam: the electron-beam pattern generator ZBA 21S with energy of electrons 20 keV (Vistec-Leica Microsystems Lithography) which allows preparation of the structures in submicrometer range of dimensions (minimal reproducible dimension 400 nm) on the substrates with diameter of up to 15 cm; electron-beam pattern generator ZBA 23 with energy of electrons 40 keV (Vistec-Leica Microsystems Lithography) which anables preparation of the samples in submicrometer range of dimensions (minimal reproducible dimension 200 nm) on the substrates with diameter of up to 18 cm. • Other infrastructure of the Electron beam lithography Department according to the following list enables the evaluation and analysis of lithographic structures, preparation of thin films, photolithography, thickness measurement of thin films, processes with polymers, polyimides, chemicals and solutions and preparation of devices for measurements: Microscopy methods: scanning electron microscope with autoemission cathode S-800 (Hitachi), 2 nm resolution. Optical microscopes. • Further equipment required for the research specialization of the Department of EBL is supplied withing the cooperation with other reserach facilities. Plasmatic etching of the structures using reactive ion etching with ECR source (ECR RIE) is supplied by the cooperation with ElÚ SAS (Institute of Electrical Engineering SAS)and plasmatic etching of the structures using reactive etching with ICP source (ICP RIE) is supplied by the cooperation with FEI STU (Faculty of Electrical Engineering STU). Supplementary scanning electron microscopy is supplied by the cooperation with ElÚ SAS on the Quanta FEG250 (FEI) equipment. |
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