Electron beam lithography - Research projects on Slovak Academy of Sciences

Your browser does not support inline frames or is currently configured not to display inline frames.
	Projects/International/RIMANA

RESEARCH PROJECT NAME

Radical Innovation Maskless Nanolithography

DESCRIPTION

FP6, STREP, No. 017133, RIMANA

Status of Department of Electron Beam Lithography (II SAS) in the project: Partner

Period: 10/2005-10/2008

Investigator II SAS: RNDr. Ivan Kostič

DETAILED INFORMATION

The specific targeted research project RIMANA (Radical Innovation Maskless Nanolithography) aims to research and develop a key maskless nanolithography technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry.

RIMANA is driven by two global industrial needs:

A maskless lithography (ML2) tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries),
A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic).

[ Electron Beam Optics and APS ]

Slovenský názov	Radikálna inovácia bezmaskovej nanolitografie
Akronym	RIMANA
Evidenčné číslo projektu	17133
Začiatok: 01.10.2005 Koniec: 30.09.2008
Koordinátor projektu	IMS Nanofabrication AG
Krajina koordinátora	Rakúsko
Program	6RP
Podprogram	Nanotechnologies and nano-sciences, knowledge-based multifunctional materials and new production processes and devices
Anotácia (EN)	The specific targeted research project RIMANA (Radical Innovation Maskless Nanolithography) aims to research and develop a key maskless nanolithography technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry. RIMANA is driven by two global industrial needs: A maskless lithography (ML2) tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries), A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic). Both global industrial needs are addressed by the RIMANA project with the following overall S/T objectives and work plans: - Concept and realisation of new, highly-innovative compact APS (programmable Aperture Plate System), including higher-speed electronics with the ability to generate a massive parallelisation of electron beams for the 32nm node and beyond. - Concept and realization of optical Data Path improvements to achieve higher data rates. - Design and generation of test benches to demonstrate sub-32nm node ML2 high throughput capabilities in resist. - Brainstorm of results with perspectives for potential industrial realisation. The key challenges will be to explore and develop essential elements for the massive parallelisation of electron-beams and 200x reduction electron-optics, retaining ultimate resolution down to the nanometer scale, while minimising throughput-resolution trade-offs. The project will be carried out by a strong and diversified team from industry, academia and acclaimed European research institutes, under the leadership of IMS Nanofabrication AG, an SME with extensive experience in cutting-edge charged particle nanofabrication research and technology. RIMANA is harmonised completely with the FP6 strategic objective IST & NMP-3. In particular, RIMANA addresses the need for "maskless nano-patterning for low to medium volume production for the 32 nm node and beyond".
Partnerské inštitúcie	Rakúsko: IMS Nanofabrication GmbH;Vienna, Seibersdorf Research GmbH;Vienna, Fachhochschule Vorarlberg;Dornbirn Česko: Delong Instruments a.s.;Brno Nemecko: Fraunhofer Gesellschaft zur Förderung der Angewandten Forschung e.V.;Mníchov Izrael: Technion–Israel Institute of Technology;Haifa Rusko: Institute of Microelectronics Technology;Černogolovka Slovensko:
WWW stránka projektu	www.rimana.org , http://cordis.europa.eu/fetch?CALLER=FP6_PROJ&ACTION=D&RCN=74659&DOC=1&CAT=PROJ&QUERY=14